This 24,000 SF (nominal) facility houses a new ISO 4 bay and chase cleanroom with a companion gown room and utility mezzanine. The cleanroom supports the CMP, etch, and implant processes. The project was designed to allow construction to occur in tandem with the day-to-day operations with minimal need to shut the fab down. Utilities, including power, heating and cooling, and process systems were provided or otherwise modified to serve the new cleanroom and support space, with utility mains and laterals routed to support the fab tools.